Study of Microstructure Regulation and In Situ Tensile Performance of Ni-Al Films

In this paper, Ni-Al films were prepared using magnetron sputtering technology. The microstructure of the and relationship between residual stress adhesion strength studied. More importantly, mechanical strength–ductility properties evaluated by in situ tensile testing. results showed that film mainly consisted Ni3Al phase Ni-based solid solution at low power Al target. transition occurred, NiAl appeared when was increased. complex structure, with coexistence solution, Ni3Al, phases, possessed increased reduced strength. Meanwhile, crack easily penetrated through inside outside film, falling off during While small large obtained, only coexisted, fell difficulty. When 400 W, largest smallest stress. best comprehensive performance achieved a 854 MPa yield 90 MPa. content up to 23.03 at.%, which beneficial application improvement molten salt corrosion resistance.